Photomask Japan 2027
Photomask Japan 2027 is the 33rd Symposium on Photomask and NGL Mask Technology, held Wednesday 7 April to Friday 9 April 2027 in the Annex Hall at PACIFICO YOKOHAMA, 1-1-1 Minato Mirai, Nishi-ku, Yokohama 220-0012, Japan.
The symposium is organized by Photomask Japan and SPIE, co-organized by BACUS and EMLC, with a technical exhibition in cooperation with SEMI Japan. The official language is English. The programme covers materials for photomasks; mask fabrication process steps and equipment for developing, etching and cleaning; photomask writing tools and technologies including multi-beam EB writers; tools and technologies for metrology, inspection and repair; technologies and infrastructures for EUVL, NIL and FPD masks; EDA, MDP, curvilinear ILT and DTCO; photomasks with RET such as PSM, OPC, SMO and multiple patterning; photomask-related lithography technologies; NGL mask technologies and their applications including DSA; strategy and business challenges for total mask solutions; patterning technologies for semiconductor and electronic devices; semiconductor manufacturing technologies; advanced packaging and chiplets; e-beam direct writing and e-beam lithography technologies; the use of AI for R&D and high-volume manufacturing efficiency; and legacy tools for mature-node masks. A dedicated session scope covers photomask and lithography technology in academia for university students and postdoctoral researchers, with a Best Academic Poster Award and the HOYA Academic Award.
Abstracts are submitted electronically in PDF form through the PMJ website; the submission deadline is 30 November 2026 and the manuscript deadline is 31 March 2027. Acceptance notifications are sent by e-mail no later than the end of January 2027. The Photomask Japan Secretariat is c/o PCO, Inc., 2-25 Sakurabashidori, Toyama 930-0004, Japan ([email protected]); SPIE Proceedings coordination is handled by [email protected].
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Venue Map and Hotels Around
Yokohama - Pacifico Yokohama, Kanagawa, Japan